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Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD

 

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Opened Access Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD
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Author: Barranco Quero, Ángel
Jiménez Marín, Alfonso
Frutos Rayego, Fabián
Cotrino Bautista, José
Yubero Valencia, Francisco
Espinós Manzarro, Juan Pedro
González Elipe, A. R.
Department: Universidad de Sevilla. Departamento de Física Aplicada I
Date: 2001
Published in: 2001 IEEE 7th International Conference on Solid Dielectrics, 303-306, June 25-29,2001, Eindhoven, the Netherlands
ISBN/ISSN: 0-7803-6352-3
Document type: Presentation
Cite: Barranco, A., Jiménez Marín, A., Frutos Rayego, F., Cotrino Bautista, J., Yubero Valencia, F., Espinós Manzarro, J.P. y González Elipe, A.R. (2001). Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE.
Size: 374.3Kb
Format: PDF

URI: http://hdl.handle.net/11441/34293

DOI: http://dx.doi.org/10.1109/ICSD.2001.955633

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