Presentation
Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD
Author/s | Barranco Quero, Ángel
Jiménez Marín, Alfonso Frutos Rayego, Fabián Cotrino Bautista, José Yubero Valencia, Francisco Espinós Manzorro, Juan Pedro González Elipe, Agustín Rodríguez |
Department | Universidad de Sevilla. Departamento de Física Aplicada I |
Publication Date | 2001 |
Deposit Date | 2016-02-08 |
Published in |
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ISBN/ISSN | 0-7803-6352-3 |
Citation | Barranco, A., Jiménez Marín, A., Frutos Rayego, F., Cotrino Bautista, J., Yubero Valencia, F., Espinós Manzorro, J.P. y González Elipe, A.R. (2001). Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE. |
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ICSD01_thinfims.pdf | 374.3Kb | [PDF] | View/ | |