Article
Quantification of self-sputtering and implantation during pulsed laser deposition of gold
Author/s | Perea Folgueras, Ángel
Gonzalo, José Budtz Jørgensen, C. Epurescu, George Siegel, Jan Afonso Rodríguez, Carmen Nieves García López, Francisco Javier |
Department | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear |
Publication Date | 2008 |
Deposit Date | 2019-10-25 |
Published in |
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Abstract | This work reports on the quantification of self-sputtering and implantation occurring during pulsed
laser deposition of Au as a function of the laser fluence used to ablate the gold target. The
experimental approach ... This work reports on the quantification of self-sputtering and implantation occurring during pulsed laser deposition of Au as a function of the laser fluence used to ablate the gold target. The experimental approach includes, on one hand, in situ electrical Langmuir and optical two-dimensional imaging probes for determining, respectively, ion and excited neutral kinetic energy distributions. On the other hand, it includes determination of the density of i ions reaching a substrate, and ii gold atoms deposited on a substrate as well as of a proportion of atoms that are self-sputtered. The experimental results supported by numerical analysis show that self-sputtering and implantation are both dominated by ions having kinetic energies 200 eV. They are a fraction 0.60–0.75 of the species arriving to the substrate for ablation laser fluences 2.7– 9.0 J cm−2. Self-sputtering yields in the range 0.60–0.86 are determined for the same fluence range. |
Project ID. | MAT2005-06508-C02-01
HPRN-CT-2002-00328 |
Citation | Perea Folgueras, Á., Gonzalo, J., Budtz Jørgensen, C., Epurescu, G., Siegel, J., Afonso Rodríguez, C.N. y García López, F.J. (2008). Quantification of self-sputtering and implantation during pulsed laser deposition of gold. Journal of Applied Physics, 104 (8), 084912. |
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