dc.creator | Perea Folgueras, Ángel | es |
dc.creator | Gonzalo, José | es |
dc.creator | Budtz Jørgensen, C. | es |
dc.creator | Epurescu, George | es |
dc.creator | Siegel, Jan | es |
dc.creator | Afonso Rodríguez, Carmen Nieves | es |
dc.creator | García López, Francisco Javier | es |
dc.date.accessioned | 2019-10-25T08:06:03Z | |
dc.date.available | 2019-10-25T08:06:03Z | |
dc.date.issued | 2008 | |
dc.identifier.citation | Perea Folgueras, Á., Gonzalo, J., Budtz Jørgensen, C., Epurescu, G., Siegel, J., Afonso Rodríguez, C.N. y García López, F.J. (2008). Quantification of self-sputtering and implantation during pulsed laser deposition of gold. Journal of Applied Physics, 104 (8), 084912. | |
dc.identifier.issn | 0021-8979 | es |
dc.identifier.issn | 1089-7550 | es |
dc.identifier.uri | https://hdl.handle.net/11441/89883 | |
dc.description.abstract | This work reports on the quantification of self-sputtering and implantation occurring during pulsed
laser deposition of Au as a function of the laser fluence used to ablate the gold target. The
experimental approach includes, on one hand, in situ electrical Langmuir and optical
two-dimensional imaging probes for determining, respectively, ion and excited neutral kinetic
energy distributions. On the other hand, it includes determination of the density of i ions reaching
a substrate, and ii gold atoms deposited on a substrate as well as of a proportion of atoms that are
self-sputtered. The experimental results supported by numerical analysis show that self-sputtering
and implantation are both dominated by ions having kinetic energies 200 eV. They are a fraction
0.60–0.75 of the species arriving to the substrate for ablation laser fluences 2.7– 9.0 J cm−2.
Self-sputtering yields in the range 0.60–0.86 are determined for the same fluence range. | es |
dc.description.sponsorship | Ministerio de Educación y Ciencias de España-MAT2005-06508-C02-01 | es |
dc.description.sponsorship | Unión Europea-HPRN-CT-2002-00328 | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | AIP Publishing | es |
dc.relation.ispartof | Journal of Applied Physics, 104 (8), 084912. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.title | Quantification of self-sputtering and implantation during pulsed laser deposition of gold | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/publishedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear | es |
dc.relation.projectID | MAT2005-06508-C02-01 | es |
dc.relation.projectID | HPRN-CT-2002-00328 | es |
dc.relation.publisherversion | https://doi.org/10.1063/1.2988145 | es |
dc.identifier.doi | 10.1063/1.2988145 | es |
idus.format.extent | 7 p. | es |
dc.journaltitle | Journal of Applied Physics | es |
dc.publication.volumen | 104 | es |
dc.publication.issue | 8 | es |
dc.publication.initialPage | 084912 | es |
dc.identifier.sisius | 6699949 | es |