Artículo
Structure of TiAlN reactive sputtered coatings
Autor/es | Denisov, V.N.
Mavrin, B.B. Vinogradov, E.A. Polyakov, S.N. Kiricjenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Fortio Godinho, Vanda Cristina Philippon, D. Fernández Camacho, Asunción |
Fecha de publicación | 2012 |
Fecha de depósito | 2019-01-15 |
Publicado en |
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Resumen | The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature ... The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm -1 or in the region of 830 - 850 cm -1 depending on the deposition parameters whereas it is not exceed 630 cm -1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiN x] with x = 5 and x = 4. The chains of polyhedra [TiN x] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N 2 gas. |
Cita | Denisov, V.N., Mavrin, B.B., Vinogradov, E.A., Polyakov, S.N., Kiricjenko, A.N., Gogolinsky, K.V.,...,Fernández Camacho, A. (2012). Structure of TiAlN reactive sputtered coatings. Journal of Nano- and Electronic Physics, 4, 01021-1-4. |
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