Artículo
Cluster Tool for In Situ Processing and Comprehensive Characterization of Thin Films at High Temperatures
Autor/es | Wenisch, Robert
Lungwitz, Frank Hanf, Daniel Heller, René Zscharschuch, Jens Hübner, René Borany, Johannes von Abrasonis, Gintautas Gemming, Sibylle Escobar-Galindo, Ramón ![]() ![]() ![]() ![]() ![]() ![]() ![]() Krause, Matthias |
Departamento | Universidad de Sevilla. Departamento de Física Aplicada I |
Fecha de publicación | 2018-05-31 |
Fecha de depósito | 2023-06-09 |
Publicado en |
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Resumen | A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from −100 to 800 °C is described. The implemented techniques ... A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from −100 to 800 °C is described. The implemented techniques comprise magnetron sputtering, ion irradiation, Rutherford backscattering spectrometry, Raman spectroscopy, and spectroscopic ellipsometry. The capability of the cluster tool is demonstrated for a layer stack MgO/amorphous Si (∼60 nm)/Ag (∼30 nm), deposited at room temperature and crystallized with partial layer exchange by heating up to 650 °C. Its initial and final composition, stacking order, and structure were monitored in situ in real time and a reaction progress was defined as a function of time and temperature. |
Cita | Wenisch, R., Lungwitz, F., Hanf, D., Heller, R., Zscharschuch, J., Hübner, R.,...,Krause, M. (2018). Cluster Tool for In Situ Processing and Comprehensive Characterization of Thin Films at High Temperatures. Analytical Chemistry, 90 (13), 7837-7842. https://doi.org/10.1021/acs.analchem.8b00923. |
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acs.analchem.8b00923.pdf | 3.447Mb | ![]() | Ver/ | |