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Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films

 

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Opened Access Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films
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Author: Parra Barranco, Julián
Sánchez Valencia, Juan Ramón
Aparicio Rebollo, Francisco Javier
Ferrer, F.J.
García García, Francisco
Rico Gavira, Víctor Joaquín
López Santos, Carmen
Borrás Martos, Ana Isabel
Rodríguez González-Elipe, Agustín
Barranco Quero, Ángel
Date: 2017
Published in: ECS Transacctions, 77 (3), 9-15.
Document type: Article
Abstract: Oblique angle deposition (OAD) is a powerful technique for the fabrication of porous nanostructured oxide thin films. OAD films typically present a columnar tilted nanostructure due to geometrical shadowing effects during the thin film growth. In this work, we study the fabrication of transparent and conducting indium tin oxide films (ITO) by OAD assisted by a microwave ECR plasma. The objective of assisting the deposition with a plasma discharge is to modify the growth mechanism of the OAD process introducing additional parameters to control the columnar microstructure, composition, porosity of the films. The results indicate the OAD ITO deposition assisted by the plasma discharge is a very effective process to develop in-plane structural anisotropy in the ITO nanocolumnar films what determines their electrical properties.
Cite: Parra Barranco, J., Sánchez Valencia, J.R., Aparicio Rebollo, F.J., Ferrer, F.J., García García, F., Rico Gavira, V.J.,...,Barranco Quero, Á. (2017). Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films. ECS Transacctions, 77 (3), 9-15.
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URI: https://hdl.handle.net/11441/78647

DOI: 10.13039/501100000780

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