Chemical and microstructural characterization of (Y or Zr)-doped CrAlN coatings

Abstract

Magnetron sputtered chromium aluminium nitride films are excellent candidates for advanced machining and protection for high temperature applications. In this work CrAlN-based coatings including Y or Zr as dopants (≈ 2 at.%) are deposited by d.c. reactive magnetron sputtering on silicon substrates using metallic targets and Ar/N2 mixtures. The hardness properties are found in the range of 22–33 GPa with H/E ratios close to 0.1. The influence of the dopant element in terms of oxidation resistance after heating in air at 1000 °C is studied by means of X-ray diffraction (XRD), cross-sectional scanning electron microscopy (X-SEM) and energy dispersive X-ray analysis (EDX). The microstructure and chemical bonding are investigated using a transmission electron microscope (TEM) and electron energy-loss spectroscopy (EELS) respectively. The improvement in oxidation resistance as compared to pure CrN coating is manifested in the formation of a Al-rich outer layer that protects the underneath coating from oxygen diffusion. The best performance obtained with the CrAlYN film is investigated by in situ annealing of this sample inside the TEM in order to gain knowledge about the structural and chemical transformations induced during heating.