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dc.creatorSánchez López, Juan Carloses
dc.creatorRojas Ruiz, Teresa Cristinaes
dc.creatorMaddi, C.es
dc.creatorLoir, A.-S.es
dc.creatorTite, T.es
dc.creatorBarnier, V.es
dc.creatorWolski, K.es
dc.creatorGarrelie, Fes
dc.date.accessioned2018-04-17T07:40:40Z
dc.date.available2018-04-17T07:40:40Z
dc.date.issued2015
dc.identifier.citationSánchez López, J.C., Rojas Ruiz, T.C., Maddi, C., Loir, A.-., Tite, T., Barnier, V.,...,Garrelie, F. (2015). High N-content a-C:N films elaborated by femtosecond PLD with plasma assistance. Applied Surface Science, 332, 346-362.
dc.identifier.issn0169-4332es
dc.identifier.urihttps://hdl.handle.net/11441/73033
dc.description.abstractAmorphous carbon nitride (a-C:N) thin films are a interesting class of carbon-based electrode materials. Therefore, synthesis and characterization of these materials have found lot of interest in environmental analytical microsystems. Herein, we report the nitrogen-doped amorphous carbon thin film elaboration by femtosecond pulsed laser deposition (fs-PLD) both with and without a plasma assistance. The chemical composition and atomic bonding configuration of the films were investigated by multi-wavelength (MW) Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and electron energy-loss spectroscopy (EELS). The highest nitrogen content, 28 at.%, was obtained with plasma assistance. The I(D)/I(G) ratio and the G peak position increased as a function of nitrogen concentration, whereas the dispersion and full width at half maximum (FWHM) of G peak decreased. This indicates more ordered graphitic like structures in the films both in terms of topological and structural, depending on the nitrogen content. EELS investigations were correlated with MW Raman results. The interpretation of XPS spectra of carbon nitride films remains a challenge. Plasma assisted PLD in the femtosecond regime led to a significant high nitrogen concentration, which is highlighted on the basis of collisional processes in the carbon plasma plume interacting with the nitrogen plasma.es
dc.description.sponsorshipPALSE ANR-11-IDEX-0007es
dc.formatapplication/pdfes
dc.language.isoenges
dc.publisherElsevieres
dc.relation.ispartofApplied Surface Science, 332, 346-362.
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.titleHigh N-content a-C:N films elaborated by femtosecond PLD with plasma assistancees
dc.typeinfo:eu-repo/semantics/articlees
dcterms.identifierhttps://ror.org/03yxnpp24
dc.type.versioninfo:eu-repo/semantics/acceptedVersiones
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.relation.projectIDANR-11-IDEX-0007es
dc.relation.publisherversionhttp://dx.doi.org/10.1016/j.apsusc.2015.01.123es
dc.identifier.doi10.1016/j.apsusc.2015.01.123es
idus.format.extent16 p.es
dc.journaltitleApplied Surface Sciencees
dc.publication.volumen332es
dc.publication.initialPage346es
dc.publication.endPage362es

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