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On the microstructure of thin films grown by an isotropically directed deposition flux

Opened Access On the microstructure of thin films grown by an isotropically directed deposition flux

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Autor: Álvarez Molina, Rafael
Romero Gómez, Pablo
Gil Rostra, Jorge
Cotrino Bautista, José
Yubero Valencia, Francisco
Palmero Acebedo, Alberto
Rodríguez González-Elipe, Agustín
Departamento: Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear
Fecha: 2010
Publicado en: Journal of Applied Physics, 108, 06431-.
Tipo de documento: Artículo
Resumen: The influence of isotropically directed deposition flux on the formation of the thin film microstructure at low temperatures is studied. For this purpose we have deposited TiO2 thin films by two different deposition techniques: reactive magnetron sputtering, in two different experimental configurations, and plasma enhanced chemical vapor deposition. The obtained results indicate that films grown under conditions where deposition particles do not possess a clear directionality, and in the absence of a relevant plasma/film interaction, present similar refractive indices no matter the deposition technique employed. The film morphology is also similar and consists of a granular surface topography and a columnarlike structure in the bulk whose diameter increases almost linearly with the film thickness. The deposition has been simulated by means of a Monte Carlo model, taking into account the main processes during growth. The agreement between simulations and experimental results indicates ...
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Cita: Álvarez Molina, R., Romero Gómez, P., Gil Rostra, J., Cotrino Bautista, J., Yubero Valencia, F., Palmero Acebedo, A. y Rodríguez González-Elipe, A. (2010). On the microstructure of thin films grown by an isotropically directed deposition flux. Journal of Applied Physics, 108, 06431-.
Tamaño: 938.3Kb
Formato: PDF

URI: https://hdl.handle.net/11441/71512

DOI: 10.1063/1.3483242

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