dc.creator | Parra Barranco, Julián | es |
dc.creator | Sánchez Valencia, Juan Ramón | es |
dc.creator | García García, Francisco Javier | es |
dc.creator | López Santos, Carmen | es |
dc.creator | González-Elipe, Agustín R. | es |
dc.creator | Aparicio Rebollo, Francisco Javier | es |
dc.creator | Rico-Gavira, Víctor Joaquín | es |
dc.creator | Barranco Quero, Ángel | es |
dc.creator | Ferrer Fernández, Francisco Javier | es |
dc.creator | Borrás Martos, Ana Isabel | es |
dc.date.accessioned | 2018-03-19T11:27:35Z | |
dc.date.available | 2018-03-19T11:27:35Z | |
dc.date.issued | 2017 | |
dc.identifier.citation | Parra Barranco, J., Sánchez Valencia, J.R., García García, F.J., López Santos, C., González-Elipe, A.R., Aparicio Rebollo, F.J.,...,Borrás Martos, A.I. (2017). Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in- Plane Anisotropic ITO Thin Films. ECS Transactions, 77 (3), 9-15. https://doi.org/10.1149/07703.0009ecst. | |
dc.identifier.issn | 1938-5862 | es |
dc.identifier.uri | https://hdl.handle.net/11441/71073 | |
dc.description.abstract | Oblique angle deposition (OAD) is a powerful technique for the fabrication of porous nanostructured oxide thin films. OAD films typically present a columnar tilted nanostructure due to geometrical shadowing effects during the thin film growth. In this work, we study the fabrication of transparent and conducting indium tin oxide films (ITO) by OAD assisted by a microwave ECR plasma. The objective of assisting the deposition with a plasma discharge is to modify the growth mechanism of the OAD process introducing additional parameters to control the columnar microstructure, composition, porosity of the films. The results indicate the OAD ITO deposition assisted by the plasma discharge is a very effective process to develop in-plane structural anisotropy in the ITO nanocolumnar films what determines their electrical properties. | es |
dc.description.sponsorship | España MINECO-AEI MAT2016-79866-R, MAT2013-40852-R, MAT2013-42900-P | es |
dc.description.sponsorship | España MINECO-CSIC 201560E055, IJCI-2014-21226, | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | Electrochemical Society | es |
dc.relation.ispartof | ECS Transactions, 77 (3), 9-15. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.title | Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in- Plane Anisotropic ITO Thin Films | es |
dc.type | info:eu-repo/semantics/article | es |
dc.type.version | info:eu-repo/semantics/acceptedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Fíca Aplicada I | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear | es |
dc.relation.projectID | MAT2016-79866-R | es |
dc.relation.projectID | MAT2013-40852-R | es |
dc.relation.projectID | MAT2013-42900-P | es |
dc.relation.projectID | 201560E055 | es |
dc.relation.projectID | IJCI-2014-21226 | es |
dc.relation.publisherversion | http://dx.doi.org/10.1149/07703.0009ecst | es |
dc.identifier.doi | 10.1149/07703.0009ecst | es |
idus.format.extent | 6 p. | es |
dc.journaltitle | ECS Transactions | es |
dc.publication.volumen | 77 | es |
dc.publication.issue | 3 | es |
dc.publication.initialPage | 9 | es |
dc.publication.endPage | 15 | es |
dc.contributor.funder | Ministerio de Economía y Competitividad (MINECO). España | |