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Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films

Opened Access Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films

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Autor: Cotrino Bautista, José
Yanguas Gil, A.
Barranco Quero, Ángel
Rodríguez González-Elipe, Agustín
Departamento: Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear
Fecha: 2006-06-26
Publicado en: Physical Review Letters, 96 (23), 236101-1-236101-4.
Tipo de documento: Artículo
Resumen: The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent β that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of β ranging from 0.86 to 0.2 are obtained.
Cita: Cotrino Bautista, J., Yanguas Gil, A., Barranco, A. y González Elipe, A.R. (2006). Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films. Physical Review Letters, 96 (23), 236101-1-236101-4.
Tamaño: 682.1Kb
Formato: PDF

URI: http://hdl.handle.net/11441/62632

DOI: 10.1103/PhysRevLett.96.236101

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