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Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films

 

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Opened Access Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films
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Author: Cotrino Bautista, José
Yanguas Gil, Alejandro
Barranco Quero, Ángel
Rodríguez González-Elipe, Agustín
Department: Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear
Date: 2006-06-26
Published in: Physical Review Letters, 96 (23), 236101-1-236101-4.
Document type: Article
Abstract: The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent β that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of β ranging from 0.86 to 0.2 are obtained.
Cite: Cotrino Bautista, J., Yanguas Gil, A., Barranco, A. y González Elipe, A.R. (2006). Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films. Physical Review Letters, 96 (23), 236101-1-236101-4.
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URI: http://hdl.handle.net/11441/62632

DOI: 10.1103/PhysRevLett.96.236101

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