Mostrar el registro sencillo del ítem
Artículo
Mechanism of Cu deposition on the α−Al2O3 (0001) surface
dc.creator | Fernández Sanz, Javier | es |
dc.creator | Cruz Hernández, Norge | es |
dc.date.accessioned | 2017-07-18T14:26:57Z | |
dc.date.available | 2017-07-18T14:26:57Z | |
dc.date.issued | 2005-01-14 | |
dc.identifier.citation | Fernández Sanz, J. y Cruz Hernández, N. (2005). Mechanism of Cu deposition on the α−Al2O3 (0001) surface. Physical Review Letters, 94 (1), 016104-1-016104-4. | |
dc.identifier.issn | 0031-9007 (impreso) | es |
dc.identifier.issn | 1079-7114 (electrónico) | es |
dc.identifier.uri | http://hdl.handle.net/11441/62630 | |
dc.description.abstract | The growth mechanism of the Cu/α−Al2O3 (0001) interface is studied by first-principles molecular-dynamics simulations as a function of the transition-metal coverage (θ) and the temperature of the system. On the anhydrous surface growth of Cu(0) 3D clusters is predicted. On the partially hydroxylated surface, a Cu(I) monolayer, relatively stable upon the temperature rising, is first observed (θ<1/3 ML). Increasing Cu loading leads to Cu(I)/Cu(0) mixed phases that when heated aggregate into 3D particles increasing the number of Cu(0) atoms, in agreement with the Auger spectra of Kelber et al. | es |
dc.description.sponsorship | Ministerio de Ciencia y Tecnología MAT2002-0576 | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | American Physical Society | es |
dc.relation.ispartof | Physical Review Letters, 94 (1), 016104-1-016104-4. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.title | Mechanism of Cu deposition on the α−Al2O3 (0001) surface | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/publishedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Química Física | es |
dc.relation.publisherversion | https://doi.org/10.1103/PhysRevLett.94.016104 | es |
dc.identifier.doi | 10.1103/PhysRevLett.94.016104 | es |
idus.format.extent | 4 p. | es |
dc.journaltitle | Physical Review Letters | es |
dc.publication.volumen | 94 | es |
dc.publication.issue | 1 | es |
dc.publication.initialPage | 016104-1 | es |
dc.publication.endPage | 016104-4 | es |
dc.contributor.funder | Ministerio de Ciencia y Tecnología (MCYT). España |
Ficheros | Tamaño | Formato | Ver | Descripción |
---|---|---|---|---|
Mechanism of Cu Deposition on ... | 667.6Kb | [PDF] | Ver/ | |