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Applying photoelasticity to masonry structures analysis


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dc.creator Mencías, David
dc.creator García, Julián
dc.creator Magdalena, Fernando 2016-02-17T18:28:04Z 2016-02-17T18:28:04Z 2015
dc.identifier.isbn 978-84-606-9356-7 es
dc.description Congreso celebrado en la Escuela de Arquitectura de la Universidad de Sevilla desde el 24 hasta el 26 de junio de 2015. es
dc.description.abstract Photoelastic analysis is proposed to study the behaviour of discontinuous and orthotropic media subjected to loads. These media are considered to be a suitable model for certain types of materials such as dry masonry. A series of tests have been carried out on similar models previously proposed by other authors, to compare the results with two numerical simulation methods commonly used for this type of structures. The results show similarities in terms of irregularity in the distribution of stresses and differences in their dispersion degree. Hence, it appears that this is a phenomenon to consider for the local behavior of this type of structures and that the stiffness of the material plays an important role to be considered in further studies. es
dc.format application/pdf es
dc.language.iso spa es
dc.publisher Víctor Compán Cardiel [etc.] es
dc.relation.ispartof 3rd International Conference on Mechanical Models in Structural Engineering, 114-125. Sevilla, España : CMMoST 2015 es
dc.rights Attribution-NonCommercial-NoDerivatives 4.0 Internacional *
dc.rights.uri *
dc.subject Masonry es
dc.subject Walls es
dc.subject Photoelasticity es
dc.subject Blocky structures es
dc.subject Fem analysis es
dc.subject Stress fields es
dc.title Applying photoelasticity to masonry structures analysis es
dc.type info:eu-repo/semantics/conferenceObject es
dc.type.version info:eu-repo/semantics/publishedVersion es
dc.rights.accessrights info:eu-repo/semantics/openAccess
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