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Applying photoelasticity to masonry structures analysis


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Opened Access Applying photoelasticity to masonry structures analysis
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Author: Mencías, David
García, Julián
Magdalena, Fernando
Date: 2015
Published in: 3rd International Conference on Mechanical Models in Structural Engineering, 114-125. Sevilla, España : CMMoST 2015
ISBN/ISSN: 978-84-606-9356-7
Document type: Presentation
Abstract: Photoelastic analysis is proposed to study the behaviour of discontinuous and orthotropic media subjected to loads. These media are considered to be a suitable model for certain types of materials such as dry masonry. A series of tests have been carried out on similar models previously proposed by other authors, to compare the results with two numerical simulation methods commonly used for this type of structures. The results show similarities in terms of irregularity in the distribution of stresses and differences in their dispersion degree. Hence, it appears that this is a phenomenon to consider for the local behavior of this type of structures and that the stiffness of the material plays an important role to be considered in further studies.
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