dc.creator | Macías Montero, Manuel Jesús | es |
dc.creator | García-García, Francisco J. | es |
dc.creator | Álvarez Molina, Rafael | es |
dc.creator | Gil Rostra, Jorge | es |
dc.creator | Gonzalez Gonzalez, Juan Carlos | es |
dc.creator | Cotrino Bautista, José | es |
dc.creator | González Elipe, Agustín Rodríguez | es |
dc.creator | Palmero Acebedo, Alberto | es |
dc.date.accessioned | 2019-10-10T11:20:14Z | |
dc.date.available | 2019-10-10T11:20:14Z | |
dc.date.issued | 2012 | |
dc.identifier.citation | Macías Montero, M.J., Garcia Garcia, F.J., Álvarez Molina, R., Gil Rostra, J., Gonzalez Gonzalez, J.C., Cotrino Bautista, J.,...,Palmero Acebedo, A. (2012). Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. Journal of Applied Physics, 111 (5), 054312. | |
dc.identifier.issn | 0021-8979 | es |
dc.identifier.issn | 1089-7550 | es |
dc.identifier.uri | https://hdl.handle.net/11441/89581 | |
dc.description.abstract | Growth of amorphous SiO2 thin films deposited by reactive magnetron sputtering at low temperatures
has been studied under different oxygen partial pressure conditions. Film microstructures varied from
coalescent vertical column-like to homogeneous compact microstructures, possessing all similar
refractive indexes. A discussion on the process responsible for the different microstructures is carried
out focusing on the influence of (i) the surface shadowing mechanism, (ii) the positive ion
impingement on the film, and (iii) the negative ion impingement. We conclude that only the trend
followed by the latter and, in particular, the impingement of O- ions with kinetic energies between 20
and 200 eV, agrees with the resulting microstructural changes. Overall, it is also demonstrated that
there are two main microstructuring regimes in the growth of amorphous SiO2 thin films by
magnetron sputtering at low temperatures, controlled by the amount of O2 in the deposition reactor,
which stem from the competition between surface shadowing and ion-induced adatom surface
mobility | es |
dc.description.sponsorship | Ministerio de Innovación español-MAT 2007-65764 | es |
dc.description.sponsorship | Ministerio de Innovación español (CONSOLIDER INGENIO 2010)-CSD2008-00023 | es |
dc.description.sponsorship | Junta de Andalucía-TEP2275, TEP5283, P07-FQM-03298 y P10-FQM-6900 | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | AIP Publishing | es |
dc.relation.ispartof | Journal of Applied Physics, 111 (5), 054312. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.title | Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/publishedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Aplicada I | es |
dc.relation.projectID | MAT 2007-65764 | es |
dc.relation.projectID | CSD2008-00023 | es |
dc.relation.projectID | TEP2275 | es |
dc.relation.projectID | TEP5283 | es |
dc.relation.projectID | P07-FQM-03298 | es |
dc.relation.projectID | P10-FQM-6900 | es |
dc.relation.publisherversion | https://aip.scitation.org/doi/10.1063/1.3691950 | es |
dc.identifier.doi | 10.1063/1.3691950 | es |
idus.format.extent | 7 p. | es |
dc.journaltitle | Journal of Applied Physics | es |
dc.publication.volumen | 111 | es |
dc.publication.issue | 5 | es |
dc.publication.initialPage | 054312 | es |