dc.creator | Álvarez Molina, Rafael | es |
dc.creator | García-Martín, José Miguel | es |
dc.creator | García-Valenzuela, Aurelio | es |
dc.creator | Macías Montero, Manuel Jesús | es |
dc.creator | Ferrer Fernández, Francisco Javier | es |
dc.creator | Santiso, José | es |
dc.creator | Cotrino Bautista, José | es |
dc.creator | Rico-Gavira, Víctor Joaquín | es |
dc.creator | Rodríguez González-Elipe, Agustín | es |
dc.creator | Palmero Acebedo, Alberto | es |
dc.date.accessioned | 2019-03-05T17:54:54Z | |
dc.date.available | 2019-03-05T17:54:54Z | |
dc.date.issued | 2016 | |
dc.identifier.citation | Álvarez Molina, R., García-Martín, J.M., García Valenzuela, A., Macías Montero, M.J., Ferrer Fernández, F.J., Santiso, J.,...,Palmero Acebedo, A. (2016). Nanostructured Ti thin films by magnetron sputtering at oblique angles. Journal of Physics D: Applied Physics, 49 (4), 045303-. | |
dc.identifier.issn | 0022-3727 | es |
dc.identifier.issn | 1361-6463 | es |
dc.identifier.uri | https://hdl.handle.net/11441/83819 | |
dc.description.abstract | The growth of Ti thin films by the magnetron sputtering technique at oblique angles and at room temperature is analysed from both experimental and theoretical points of view. Unlike other materials deposited in similar conditions, the nanostructure development of the Ti layers exhibits an anomalous behaviour when varying both the angle of incidence of the deposition flux and the deposition pressure. At low pressures, a sharp transition from compact to isolated, vertically aligned, nanocolumns is obtained when the angle of incidence surpasses a critical threshold. Remarkably, this transition also occurs when solely increasing the deposition pressure under certain conditions. By the characterization of the Ti layers, the realization of fundamental experiments and the use of a simple growth model, we demonstrate that surface mobilization processes associated to a highly directed momentum distribution and the relatively high kinetic energy of sputtered atoms are responsible for this behaviour | es |
dc.description.sponsorship | Junta de Andalucía P12-FQM- 2265 | es |
dc.description.sponsorship | Ministerio de Ciencia e Innovación CSD2008- 00023, MAT2013-42900-P, MAT2013-40852-R, MAT2014-59772-C2-1, MAT2011- 29081 | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | Institute of Physics Publishing | es |
dc.relation.ispartof | Journal of Physics D: Applied Physics, 49 (4), 045303-. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.title | Nanostructured Ti thin films by magnetron sputtering at oblique angles | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/submittedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear | es |
dc.relation.projectID | P12-FQM- 2265 | es |
dc.relation.projectID | CSD2008- 00023 | es |
dc.relation.projectID | MAT2013-42900-P | es |
dc.relation.projectID | MAT2013-40852-R | es |
dc.relation.projectID | MAT2014-59772-C2-1 | es |
dc.relation.projectID | MAT2011- 29081 | es |
dc.relation.publisherversion | http://dx.doi.org/10.1088/0022-3727/49/4/045303 | es |
dc.identifier.doi | 10.1088/0022-3727/49/4/045303 | es |
idus.format.extent | 40 p. | es |
dc.journaltitle | Journal of Physics D: Applied Physics | es |
dc.publication.volumen | 49 | es |
dc.publication.issue | 4 | es |
dc.publication.initialPage | 045303 | es |
dc.contributor.funder | Junta de Andalucía | |
dc.contributor.funder | Ministerio de Ciencia e Innovación (MICIN). España | |