Artículo
Surface nanostructuring of TiO2 thin films by ion beam irradiation
Autor/es | Romero Gómez, Pablo
Palmero Acebedo, Alberto Yubero Valencia, Francisco Vinnichenko, M. Kolitsch, A. Rodríguez González-Elipe, Agustín |
Departamento | Universidad de Sevilla. Departamento de Química Inorgánica |
Fecha de publicación | 2009 |
Fecha de depósito | 2018-04-25 |
Publicado en |
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Resumen | This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids ... This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids at a depth similar to the ion-projected range. By setting the ion-projected range a few tens of nanometers below the surface of the film, well-ordered nanorods appear aligned with the angle of incidence of the ion beam. Slightly different results were obtained by using heavier (S+) and lighter (B+) ions under similar conditions. |
Cita | Romero Gómez, P., Palmero Acebedo, A., Yubero Valencia, F., Vinnichenko, M., Kolitsch, A. y Rodríguez González-Elipe, A. (2009). Surface nanostructuring of TiO2 thin films by ion beam irradiation. Scripta Materialia, 60, 1-18. |
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