dc.creator | Martínez Martínez, Diego | es |
dc.creator | López Cartes, Carlos | es |
dc.creator | Fernández Camacho, Asunción | es |
dc.creator | Sánchez López, Juan Carlos | es |
dc.date.accessioned | 2018-02-16T14:42:51Z | |
dc.date.available | 2018-02-16T14:42:51Z | |
dc.date.issued | 2013 | |
dc.identifier.citation | Martínez Martínez, D., López Cartes, C., Fernández Camacho, M.A. y Sánchez López, J.C. (2013). Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering. Applied Surface Science, 275, 121-126. | |
dc.identifier.issn | 0169-4332 | es |
dc.identifier.uri | https://hdl.handle.net/11441/70372 | |
dc.description.abstract | The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films. | es |
dc.description.sponsorship | Ministerio de Economía y Competitividad MAT2010-21597-C02-01, MAT2011-29074-C02-01, CSD2008-00023 | es |
dc.description.sponsorship | Junta de Andalucía P10-TEP 06782 | es |
dc.format | application/pdf | es |
dc.language.iso | eng | es |
dc.publisher | Elsevier | es |
dc.relation.ispartof | Applied Surface Science, 275, 121-126. | |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.subject | TiN | es |
dc.subject | Target | es |
dc.subject | Magnetron sputtering | es |
dc.subject | XRD | es |
dc.subject | Stress | es |
dc.subject | Hardness | es |
dc.title | Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/submittedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Química Inorgánica | es |
dc.relation.projectID | MAT2010-21597-C02-01 | es |
dc.relation.projectID | MAT2011-29074-C02-01 | es |
dc.relation.projectID | CSD2008-00023 | es |
dc.relation.projectID | P10-TEP 06782 | es |
dc.relation.publisherversion | http://dx.doi.org/10.1016/j.apsusc.2013.01.098 | es |
dc.identifier.doi | 10.1016/j.apsusc.2013.01.098 | es |
idus.format.extent | 24 p. | es |
dc.journaltitle | Applied Surface Science | es |
dc.publication.volumen | 275 | es |
dc.publication.initialPage | 121 | es |
dc.publication.endPage | 126 | es |
dc.contributor.funder | Ministerio de Economía y Competitividad (MINECO). España | |
dc.contributor.funder | Junta de Andalucía | |