Artículo
Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films
Autor/es | Cotrino Bautista, José
Yanguas Gil, Alejandro Barranco Quero, Ángel Rodríguez González-Elipe, Agustín |
Departamento | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear |
Fecha de publicación | 2006-06-26 |
Fecha de depósito | 2017-07-18 |
Publicado en |
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Resumen | The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and ... The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent β that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of β ranging from 0.86 to 0.2 are obtained. |
Cita | Cotrino Bautista, J., Yanguas Gil, A., Barranco, A. y González Elipe, A.R. (2006). Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films. Physical Review Letters, 96 (23), 236101-1-236101-4. |
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