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Listar Artículos (Física Atómica, Molecular y Nuclear) por autor "Yanguas Gil, Alejandro"
Mostrando ítems 1-3 de 3
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Artículo
Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films
Cotrino Bautista, José; Yanguas Gil, Alejandro; Barranco Quero, Ángel; Rodríguez González-Elipe, Agustín (American Physical Society, 2006-06-26)The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced ...
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Artículo
Relationship between scaling behavior and porosity of plasma-deposited TiO2 thin films
Borrás, A.; Yanguas Gil, Alejandro; Barranco Quero, Ángel; Cotrino Bautista, José; Rodríguez González-Elipe, Agustín (American Physical Society, 2007)The growth of TiO2 thin films prepared by plasma enhanced chemical vapor deposition has been studied by analyzing their ...
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Artículo
Scaling behavior and mechanism of formation of Si O2 thin films grown by plasma-enhanced chemical vapor deposition
Yanguas Gil, Alejandro; Cotrino Bautista, José; Walkiewicz-Pietrzykowska, A.; Rodríguez González-Elipe, Agustín (American Physical Society, 2007)This paper reports a study of the kinetic roughening of Si O2 thin films prepared by plasma-enhanced chemical vapor ...