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Artículo
Optical refractive index and static permittivity of mixed Zr–Si oxide thin films prepared by ion beam induced CVD
(Elsevier, 2007)
Mixed oxides ZrxSi1−xO2 (0bxb1) thin films have been prepared at room temperature by decomposition of (CH3CH2O)3SiH and Zr[OC (CH3)3]4 volatile precursors induced by mixtures of O2 + and Ar+ ions. The films were flat and ...
Artículo
Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature
(Elsevier, 2009)
Mixed Zr–Si oxide thin films have been prepared at room temperature by ion beam decomposition of organometallic volatile precursors. The films were flat and amorphous. They did not present phase segregation of the pure ...
Artículo
Low refractive index SiOF thin films prepared by reactive magnetron sputtering
(Elsevier, 2013)
We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition ...
Artículo
Wetting Angles on Illuminated Ta2O5 Thin Films with Controlled Nanostructure
(American Chemical Society, 2009)
Ta2O5 thin films with different nanostructure and surface roughness have been prepared by electron evaporation at different angles between the evaporation source and the substrates. Large variation of refraction indexes (n) ...
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Artículo
Synthesis, characterization, and photoactivity of InTaO4 and In0.9Ni0.1TaO4 thin films prepared by electron evaporation
(American Vacuum Society, 2010)
InTaO4 and In0.9Ni0.1TaO4 thin films have been prepared by electron evaporation of successive layers of the single oxide components and posterior annealing at T 800 °C. The annealed thin films presented the monoclinic ...