Artículo
Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures
Autor/es | García-Martín, José Miguel
Álvarez Molina, Rafael Romero Gómez, Pablo Cebollada, Alfonso Palmero Acebedo, Alberto |
Departamento | Universidad de Sevilla. Departamento de Física Aplicada I |
Fecha de publicación | 2010 |
Fecha de depósito | 2019-02-21 |
Publicado en |
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Resumen | We show that the tilt angle of nanostructures obtained by glancing angle sputtering is finely tuned by selecting the adequate argon pressure. At low pressures, a ballistic deposition regime dominates, yielding high directional ... We show that the tilt angle of nanostructures obtained by glancing angle sputtering is finely tuned by selecting the adequate argon pressure. At low pressures, a ballistic deposition regime dominates, yielding high directional atoms that form tilted nanocolumns. High pressures lead to a diffusive regime which gives rise to vertical columnar growth. Monte Carlo simulations reproduce the experimental results indicating that the loss of directionality of the sputtered particles in the gas phase, together with the self-shadowing mechanism at the surface, are the main processes responsible for the development of the columns. |
Identificador del proyecto | CSD 2008-00023
MAT 2008-06765-C02-01/NAN MAT 2007-65764 PIE 200960I132 S2009/MAT-1726 TEP2275 P07-FQM-03298 NMP3-SL-2008-214107 |
Cita | García-Martín, J.M., Álvarez Molina, R., Romero Gómez, P., Cebollada, A. y Palmero Acebedo, A. (2010). Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures. Applied Physics Letters, 97, 173103-. |
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