A chip designed in a 0.18 μm CMOS Image Sensor Technology (CIS) is presented which incorporates different pixel design alternatives for Active Pixel Sensor (APS). CIS technology improves characteristics such as sensitivity, dark current and noise, that are strongly layout dependent. This chip includes a set of pixel architectures where different parameters have been modified: layout of active diffusion, threshold voltage of the source follower transistor and the use of microlenses. Besides, structures to study the influence of crosstalk between pixels have been incorporated.
