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Artículo
Optical refractive index and static permittivity of mixed Zr–Si oxide thin films prepared by ion beam induced CVD
(Elsevier, 2007)
Mixed oxides ZrxSi1−xO2 (0bxb1) thin films have been prepared at room temperature by decomposition of (CH3CH2O)3SiH and Zr[OC (CH3)3]4 volatile precursors induced by mixtures of O2 + and Ar+ ions. The films were flat and ...
Artículo
Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature
(Elsevier, 2009)
Mixed Zr–Si oxide thin films have been prepared at room temperature by ion beam decomposition of organometallic volatile precursors. The films were flat and amorphous. They did not present phase segregation of the pure ...