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Artículo
Room temperature synthesis of porous SiO2 thin films by plasma enhanced chemical vapor deposition
(AVS Science and Technology Society, 2004-07)
Synthesis of porous SiO2 thin films in room temperature was carried out using plasma enhanced chemical vapor deposition (CVD) in an electron cyclotron resonance microwave reactor with a downstream configuration.The gas ...
Artículo
Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas
(AVS Science and Technology Society, 2003-07)
Silicon dioxide thin films have been prepared at room temperature by remote plasma-enhanced chemical vapor deposition in a downstream reactor by using Si(CH3)3Cl as a volatile precursor and a microwave electron cyclotron ...