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Listar por autor "Camelio, S."
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Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas
Barranco Quero, Ángel; Cotrino Bautista, José; Yubero Valencia, Francisco; Girardeau, T.; Camelio, S.; Clerc, C.; Rodríguez González-Elipe, Agustín (AVS Science and Technology Society, 2003-07)Silicon dioxide thin films have been prepared at room temperature by remote plasma-enhanced chemical vapor deposition in ...