Article
Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering
Author/s | Martínez Martínez, Diego
López Cartes, Carlos Fernández Camacho, Asunción Sánchez López, Juan Carlos |
Department | Universidad de Sevilla. Departamento de Química Inorgánica |
Publication Date | 2013 |
Deposit Date | 2018-02-16 |
Published in |
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Abstract | The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a ... The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films. |
Funding agencies | Ministerio de Economía y Competitividad (MINECO). España Junta de Andalucía |
Project ID. | MAT2010-21597-C02-01
MAT2011-29074-C02-01 CSD2008-00023 P10-TEP 06782 |
Citation | Martínez Martínez, D., López Cartes, C., Fernández Camacho, M.A. y Sánchez López, J.C. (2013). Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering. Applied Surface Science, 275, 121-126. |
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