Article
Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering
Author/s | Vergara, Lucía
Escobar-Galindo, Ramón ![]() ![]() ![]() ![]() ![]() ![]() ![]() Martínez, R. Sánchez, Olga Palacio Orcajo, Carlos Albella Martín, José María |
Department | Universidad de Sevilla. Departamento de Física Aplicada I |
Publication Date | 2011-03-31 |
Deposit Date | 2023-06-22 |
Published in |
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Abstract | The development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such ... The development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such as tribology, optics or microelectronics. In this paper we investigate the deposition of mixed chromium and silicon oxides deposited by reactive magnetron sputtering with a view to use them as optical coatings with an adjustable refractive index. These films have been characterized by means of Rutherford backscattering spectrometry, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy, Fourier-transform infrared spectroscopy and spectroscopic ellipsometry so as to determine how the deposition conditions influence the characteristics of the material. We have found that the deposition parameter whose influence determines the properties of the films to a greater extent is the amount of oxygen in the reactive sputtering gas. |
Funding agencies | Ministerio de Ciencia e Innovación (MICIN). España |
Project ID. | CSD2008-00023 (CONSOLIDER-Ingenio 2010)
![]() MAT2008-06618-C02-02/MAT ![]() RyC2007-0026 ![]() |
Citation | Vergara, L., Escobar-Galindo, R., Martínez, R., Sánchez, O., Palacio Orcajo, C. y Albella, J.M. (2011). Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering. Thin Solid Films, 519 (11), 3509-3515. https://doi.org/10.1016/j.tsf.2011.01.103. |
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