dc.creator | García Valenzuela, Aurelio | es |
dc.creator | Álvarez Molina, Rafael | es |
dc.creator | Rico-Gavira, Víctor Joaquín | es |
dc.creator | Cotrino Bautista, José | es |
dc.creator | Rodríguez González-Elipe, Agustín | es |
dc.creator | Palmero, A. | es |
dc.date.accessioned | 2023-04-19T09:18:46Z | |
dc.date.available | 2023-04-19T09:18:46Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 0257-8972 | es |
dc.identifier.issn | 1879-3347 | es |
dc.identifier.uri | https://hdl.handle.net/11441/144624 | |
dc.description.abstract | The selective incorporation of deposition species with preferential directionality is analyzed during the growth
of TiO2 thin films by magnetron sputtering. Using wisely-designed collimators, tilted nanocolumnar morphol-
ogies are grown in a ballistic deposition regime, i.e. when most deposition species arrive at the film surface along
well-defined preferential directions, and also in a thermalized deposition regime, when these species follow an
isotropic momentum distribution in the plasma gas. The obtained results suggest that the use of particle colli-
mators may promote the growth of porous thin films even in the classical magnetron sputtering configuration,
when the target and the substrate are parallel. General insights are given on this approach and, as a proof of
concept, its principles applied for the synthesis of nanostructured films in a laboratory-size reactor. | es |
dc.description.sponsorship | Universidad de Sevilla - VPPI-US | es |
dc.description.sponsorship | Junta de Andalucía-TEP8067, TEP5283 y P12–2265MO | es |
dc.description.sponsorship | Ministerio de Economía y Competitividad de España - MAT2013-42900-P, MAT2013-40852-R, MAT2016-79866-R y MAT2015-69035-REDC | es |
dc.format | application/pdf | es |
dc.format.extent | 6 p. | es |
dc.language.iso | eng | es |
dc.publisher | Elsevier | es |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 Internacional | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | * |
dc.subject | Reactive magnetron sputtering | es |
dc.subject | TiO2 | es |
dc.subject | Oblique angle deposition | es |
dc.subject | Porous thin films | es |
dc.subject | GLAD | es |
dc.subject | PVD | |
dc.title | Growth of nanocolumnar porous TiO2 thin films by magnetron sputtering using particle collimators | es |
dc.type | info:eu-repo/semantics/article | es |
dcterms.identifier | https://ror.org/03yxnpp24 | |
dc.type.version | info:eu-repo/semantics/acceptedVersion | es |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear | es |
dc.contributor.affiliation | Universidad de Sevilla. Departamento de Física Aplicada I | es |
dc.relation.projectID | VPPI-US | es |
dc.relation.projectID | TEP8067 | es |
dc.relation.projectID | TEP5283 | es |
dc.relation.projectID | P12–2265MO | es |
dc.relation.projectID | MAT2013-42900-P | es |
dc.relation.projectID | MAT2013-40852-R | es |
dc.relation.projectID | MAT2016-79866-R | es |
dc.relation.projectID | MAT2015-69035-REDC | es |
dc.relation.publisherversion | https://doi.org/10.1016/j.surfcoat.2017.09.039 | es |
dc.identifier.doi | 10.1016/j.surfcoat.2017.09.039 | es |
dc.journaltitle | Surface & Coatings Technology | es |
dc.publication.volumen | 343 | es |
dc.publication.issue | 15 | es |
dc.publication.initialPage | 172 | es |
dc.publication.endPage | 177 | es |
dc.contributor.funder | Universidad de Sevilla | es |
dc.contributor.funder | Junta de Andalucía | es |
dc.contributor.funder | Ministerio de Economía y Competitividad (MINECO). España | es |