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High N-content a-C:N films elaborated by femtosecond PLD with plasma assistance

Opened Access High N-content a-C:N films elaborated by femtosecond PLD with plasma assistance

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Autor: Sánchez López, Juan Carlos
Rojas Ruiz, Teresa Cristina
Maddi, C.
Loir, A.-S.
Tite, T.
Barnier, V.
Wolski, K.
Garrelie, F
Fecha: 2015
Publicado en: Applied Surface Science, 332, 346-362.
Tipo de documento: Artículo
Resumen: Amorphous carbon nitride (a-C:N) thin films are a interesting class of carbon-based electrode materials. Therefore, synthesis and characterization of these materials have found lot of interest in environmental analytical microsystems. Herein, we report the nitrogen-doped amorphous carbon thin film elaboration by femtosecond pulsed laser deposition (fs-PLD) both with and without a plasma assistance. The chemical composition and atomic bonding configuration of the films were investigated by multi-wavelength (MW) Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and electron energy-loss spectroscopy (EELS). The highest nitrogen content, 28 at.%, was obtained with plasma assistance. The I(D)/I(G) ratio and the G peak position increased as a function of nitrogen concentration, whereas the dispersion and full width at half maximum (FWHM) of G peak decreased. This indicates more ordered graphitic like structures in the films both in terms of topological and structural, depending on ...
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Cita: Sánchez López, J.C., Rojas Ruiz, T.C., Maddi, C., Loir, A.-., Tite, T., Barnier, V.,...,Garrelie, F. (2015). High N-content a-C:N films elaborated by femtosecond PLD with plasma assistance. Applied Surface Science, 332, 346-362.
Tamaño: 951.5Kb
Formato: PDF

URI: https://hdl.handle.net/11441/73033

DOI: 10.1016/j.apsusc.2015.01.123

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