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STEM‐EELS analysis reveals stable high‐density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering

Opened Access STEM‐EELS analysis reveals stable high‐density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering

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Autor: Schierholz, Roland
Lacroix, Bertrand
Fortio Godinho, Vanda Cristina
Caballero Hernández, Jaime
Duchamp, Martial
Fernández Camacho, Asunción
Departamento: Universidad de Sevilla. Departamento de Química Inorgánica
Fecha: 2015
Publicado en: Nanotechnology, 26 (7), 1-17.
Tipo de documento: Artículo
Resumen: A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low‐energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy‐loss spectroscopy (EELS) in a scanning transmission electron microscope (STEM) is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K‐edge. A good agreement was observed between the high density (~35‐60 at/nm3) and pressure (0.3‐1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, pro...
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Cita: Schierholz, R., Lacroix, B., Fortio Godinho, V.C., Caballero Hernández, J., Duchamp, M. y Fernández Camacho, A. (2015). STEM‐EELS analysis reveals stable high‐density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering. Nanotechnology, 26 (7), 1-17.
Tamaño: 537.3Kb
Formato: PDF

URI: https://hdl.handle.net/11441/73032

DOI: 10.1088/0957-4484/26/7/075703

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