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Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

 

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dc.creator Martínez Martínez, Diego es
dc.creator López Cartes, Carlos es
dc.creator Fernández Camacho, Asunción es
dc.creator Sánchez López, Juan Carlos es
dc.date.accessioned 2018-02-16T14:42:51Z
dc.date.available 2018-02-16T14:42:51Z
dc.date.issued 2013
dc.identifier.citation Martínez Martínez, D., López Cartes, C., Fernández Camacho, M.A. y Sánchez López, J.C. (2013). Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering. Applied Surface Science, 275, 121-126.
dc.identifier.issn 0169-4332 es
dc.identifier.uri https://hdl.handle.net/11441/70372
dc.description.abstract The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films. es
dc.description.sponsorship Ministerio de Economía y Competitividad MAT2010-21597-C02-01, MAT2011-29074-C02-01, CSD2008-00023 es
dc.description.sponsorship Junta de Andalucía P10-TEP 06782 es
dc.format application/pdf es
dc.language.iso eng es
dc.publisher Elsevier es
dc.relation.ispartof Applied Surface Science, 275, 121-126.
dc.rights Attribution-NonCommercial-NoDerivatives 4.0 Internacional *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/4.0/ *
dc.subject TiN es
dc.subject Target es
dc.subject Magnetron sputtering es
dc.subject XRD es
dc.subject Stress es
dc.subject Hardness es
dc.title Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering es
dc.type info:eu-repo/semantics/article es
dc.type.version info:eu-repo/semantics/submittedVersion es
dc.rights.accessrights info:eu-repo/semantics/openAccess es
dc.contributor.affiliation Universidad de Sevilla. Departamento de Química Inorgánica es
dc.relation.projectID MAT2010-21597-C02-01 es
dc.relation.projectID MAT2011-29074-C02-01 es
dc.relation.projectID CSD2008-00023 es
dc.relation.projectID P10-TEP 06782 es
dc.relation.publisherversion http://dx.doi.org/10.1016/j.apsusc.2013.01.098 es
dc.identifier.doi 10.1016/j.apsusc.2013.01.098 es
idus.format.extent 24 p. es
dc.journaltitle Applied Surface Science es
dc.publication.volumen 275 es
dc.publication.initialPage 121 es
dc.publication.endPage 126 es
dc.contributor.funder Ministerio de Economía y Competitividad (MINECO). España
dc.contributor.funder Junta de Andalucía
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