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Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

 

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Opened Access Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering
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Autor: Martínez Martínez, Diego
López Cartes, Carlos
Fernández Camacho, Asunción
Sánchez López, Juan Carlos
Departamento: Universidad de Sevilla. Departamento de Química Inorgánica
Fecha: 2013
Publicado en: Applied Surface Science, 275, 121-126.
Tipo de documento: Artículo
Resumen: The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films.
Cita: Martínez Martínez, D., López Cartes, C., Fernández Camacho, M.A. y Sánchez López, J.C. (2013). Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering. Applied Surface Science, 275, 121-126.
Tamaño: 2.933Mb
Formato: PDF

URI: https://hdl.handle.net/11441/70372

DOI: 10.1016/j.apsusc.2013.01.098

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