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dc.creatorBarranco Quero, Ángeles
dc.creatorCotrino Bautista, Josées
dc.creatorYubero Valencia, Franciscoes
dc.creatorEspinós Manzorro, Juan Pedroes
dc.creatorRodríguez González-Elipe, Agustínes
dc.date.accessioned2017-08-01T11:47:30Z
dc.date.available2017-08-01T11:47:30Z
dc.date.issued2004-07
dc.identifier.citationBarranco Quero, Á., Cotrino Bautista, J., Yubero Valencia, F., Espinós, J.P. y Rodríguez González-Elipe, A. (2004). Room temperature synthesis of porous SiO2 thin films by plasma enhanced chemical vapor deposition. Journal of Vacuum Science and Technology A, 22 (4), 1275-1284.
dc.identifier.issn0734-2101es
dc.identifier.urihttp://hdl.handle.net/11441/63465
dc.description.abstractSynthesis of porous SiO2 thin films in room temperature was carried out using plasma enhanced chemical vapor deposition (CVD) in an electron cyclotron resonance microwave reactor with a downstream configuration.The gas adsorption properties and the type of porosity of the SiO2 thin films were assessed by adsorption isotherms of toluene at room temperature.The method could also permit the tailoring synthesis of thin films when both composition and porosity can be simultaneously and independently controlled. The result shows that it is possible to control the microstructure of oxide thin films deposited by room temperature plasma enhanced chemical vapor depositon (PECVD) by scarificial polymeric organic layers.es
dc.description.sponsorshipMinisterio de Ciencia y Tecnología MAT2001-2820es
dc.description.sponsorshipEuropean Union ENV4-CT97-0633es
dc.formatapplication/pdfes
dc.language.isoenges
dc.publisherAVS Science and Technology Societyes
dc.relation.ispartofJournal of Vacuum Science and Technology A, 22 (4), 1275-1284.
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.titleRoom temperature synthesis of porous SiO2 thin films by plasma enhanced chemical vapor depositiones
dc.typeinfo:eu-repo/semantics/articlees
dcterms.identifierhttps://ror.org/03yxnpp24
dc.type.versioninfo:eu-repo/semantics/publishedVersiones
dc.rights.accessrightsinfo:eu-repo/semantics/openAccesses
dc.contributor.affiliationUniversidad de Sevilla. Departamento de Química Inorgánicaes
dc.relation.projectIDMAT2001-2820es
dc.relation.projectIDENV4-CT97-0633es
dc.relation.publisherversionhttp://dx.doi.org/10.1116/1.1761072es
dc.identifier.doi10.1116/1.1761072es
idus.format.extent10 p.es
dc.journaltitleJournal of Vacuum Science and Technology Aes
dc.publication.volumen22es
dc.publication.issue4es
dc.publication.initialPage1275es
dc.publication.endPage1284es
dc.contributor.funderMinisterio de Ciencia y Tecnología (MCYT). España
dc.contributor.funderEuropean Union (UE)

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