2019-10-252019-10-252008Perea Folgueras, Á., Gonzalo, J., Budtz Jørgensen, C., Epurescu, G., Siegel, J., Afonso Rodríguez, C.N. y García López, F.J. (2008). Quantification of self-sputtering and implantation during pulsed laser deposition of gold. Journal of Applied Physics, 104 (8), 084912.0021-89791089-7550https://hdl.handle.net/11441/89883This work reports on the quantification of self-sputtering and implantation occurring during pulsed laser deposition of Au as a function of the laser fluence used to ablate the gold target. The experimental approach includes, on one hand, in situ electrical Langmuir and optical two-dimensional imaging probes for determining, respectively, ion and excited neutral kinetic energy distributions. On the other hand, it includes determination of the density of i ions reaching a substrate, and ii gold atoms deposited on a substrate as well as of a proportion of atoms that are self-sputtered. The experimental results supported by numerical analysis show that self-sputtering and implantation are both dominated by ions having kinetic energies 200 eV. They are a fraction 0.60–0.75 of the species arriving to the substrate for ablation laser fluences 2.7– 9.0 J cm−2. Self-sputtering yields in the range 0.60–0.86 are determined for the same fluence range.application/pdfengAttribution-NonCommercial-NoDerivatives 4.0 Internacionalhttp://creativecommons.org/licenses/by-nc-nd/4.0/info:eu-repo/semantics/articleinfo:eu-repo/semantics/openAccess10.1063/1.2988145