Eijt, S.W.H.Veen, A. vanFalub, Claudiu V.Escobar-Galindo, RamónSchut, HenkMijnarends, P.E.Theije, Fremke deBalkenende, A.R.2023-07-042023-07-042003Eijt, S.W.H., Veen, A.v., Falub, C.V., Escobar-Galindo, R., Schut, H., Mijnarends, P.E.,...,Balkenende, .R. (2003). Depth-selective 2D-ACAR studies on low-k dielectric thin films. Radiation Physics and Chemistry, 68 (3-4), 357-362. https://doi.org/10.1016/S0969-806X(03)00184-1.0969-806X (impreso)1879-0895 (online)https://hdl.handle.net/11441/147680Parte del número especial: Proceedings of the 7th International Conference on Positron and Positronium ChemistryDepth-selective 2D-ACAR investigations on ordered mesoporous silica thin films provide direct evidence that para-positronium (p-Ps) created deep in the films can escape through a network of interconnected pores. The depth dependence of the escape fraction and of the average kinetic energy of non-thermally excited p-Ps is in quantitative agreement with Monte Carlo modeling, assuming classical collisions of p-Ps with the pore walls. The model provides insight in the shape of the angular correlation distributions and their sensitivity to, e.g., the effective wall mass Ms and pore dimensions.application/pdf6engAttribution-NonCommercial-NoDerivatives 4.0 Internacionalhttp://creativecommons.org/licenses/by-nc-nd/4.0/Non-thermal positronium2D-ACARMesoporous filmEffusionPercolationDepth profilinginfo:eu-repo/semantics/articleinfo:eu-repo/semantics/openAccesshttps://doi.org/10.1016/S0969-806X(03)00184-1